Eulitha - Grating Uniformity and Pitch Accuracy Validation of DTL Based Gratings

Eulitha is a lithography equipment provider and a solution partner for customers, especially in photonics markets including AR/VR devices, optoelectronics, sensors, semiconductor lasers and biotechnology. Using its patented Displacement Talbot Lithography (DTL) technology, Eulitha provides high-resolution, non-contact optical patterning of periodic nanostructures. DTL is a scalable and cost-effective solution due to the large exposure field, large depth of focus, high throughput, and use of industry-standard masks and photoresists.

A test report in collaboration with Eulitha

OptoFidelity’s WG-GAT Littrow Diffractometer was used to measure Eulitha’s grating sample, manufactured using DTL. The 150 mm wafer was evaluated for pitch accuracy, as well as pitch and orientation uniformity across the grating. The sample demonstrated high accuracy and fidelity. Additionally, a measurement reproducibility study confirmed that the diffractometer provides noise-free, robust scanning with high resolution and uniformity at picometer and arcsecond levels. This precision meets the strict metrology requirements of the AR industry as it shifts toward higher-volume grating manufacturing.

This collaboration demonstrated that Eulitha’s DTL manufacturing capabilities are suitable for the diffractive AR waveguide industry, and OptoFidelity’s Littrow Diffractometer is versatile and accurate for characterizing grating parameters.

To look in-depth into the methods and results, download the full test report below.